More might be better

Well, I discovered this today. It may pertain to certain polishes so I think I might try it out with some others.



My normal pattern for polishing with the DA is side to side, then up and down, and then slanted. I'll then go over it again side to side using a very light pressure, almost lifting the buffer off the surface so it takes off a lot of the residue.



This very thin residue from this particular polish was hard to get off! I was having to apply a decent amount of pressure (something I don't like to do) in order to get the polish off! It was also smearing around on the surface. I don't understand what was smearing around since this polish isn't suppose to contain fillers.



Well, one time as I was applying polish to the pad I got carried away and put a little too much down. Well, after I finished my routine this time there was still a lot of residue down. It formed a nice haze on the paint. I didn't mind and just moved on.



Well, when I went back to buff this area I didn't have to apply any pressure at all! The towel was just grabbing the residue right off the paint! The thicker residue was easier to buff off than the thin residue!



I might have to try this with 3m SMR to see if it helps with the residue it leaves behind.
 
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